Electron attachment to C7F14 and SF6 in a thermally ionized potassium plasma.

نویسندگان

  • Su-Hyun Kim
  • Robert L Merlino
چکیده

Electron attachment to perfluoromethylcyclohexane (C7F14) and sulfur hexafluoride (SF6) is studied in a Q machine which produces a thermally ionized potassium plasma at an electron temperature Te approximately = 0.2 eV (2300 K) . Negative ion formation is observed by Langmuir probe measurements of the reduction in electron density as electrons attach to C7F14 to form C7F14- or to SF6 to produce SF6- . In C7F14 at a pressure approximately 3x10(-5) Torr , a nearly electron-free plasma is formed with a residual electron-to-ion density ratio ne/n+ < 10(-4) . Formation of the C7F14- negative ion was confirmed by the presence of the C7F14- electrostatic ion cyclotron wave mode in the power spectrum of current-driven plasma oscillations. Measurements of the negative ion-to-electron density ratio, n_/ne for different pressures in both C7F14 and SF6 indicate that for thermal electrons at 2300 K larger values of n_/ne are obtained in C7F14 at a lower pressure than in SF6 .

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عنوان ژورنال:
  • Physical review. E, Statistical, nonlinear, and soft matter physics

دوره 76 3 Pt 2  شماره 

صفحات  -

تاریخ انتشار 2007